Hard X-ray Photoelectron Spectroscopy P22
The Hard X-Ray Photoelectron Spectroscopy beamline P22 at PETRA III is dedicated to study the electronic and atomic structure of surfaces, interfaces, and bulk materials. The beam line offers several end stations specialized for HAXPES, k-microscopy, HAXPEEM and high Pressure XPSUsed for analysing a material’s surface chemistry. It can measure the elemental composition and the electronic and chemical state of a material’s atoms.More info. It serves users from diverse research fields including physics, chemistry, materials science and engineering. Some of the main research topics are microelectronics and device characterization, solar cell and battery research, catalysis, new materials (e.g. for memory devices, spintronics) and fundamental solid-state physics.
Hard X-ray photoelectron spectroscopy (HAXPES, see XPSUsed for analysing a material’s surface chemistry. It can measure the elemental composition and the electronic and chemical state of a material’s atoms.More info) is developing at synchrotron laboratories worldwide because of its ability to probe the detailed electronic structure of solid materials with significantly higher depth sensitivity than conventional photoelectron spectroscopy. This makes it ideally suited for the investigation of bulk complex correlated materials, buried interfaces of multi-layered functional materials or as-grown samples without any need for prior in-situ surface treatment.
The second setup is a Hard X-ray photoemission electron microscopy (HAXPEEM, see XPEEMAn XPEEM (X-ray Photoemission Electron Microscope) can perform micro-XPS, micro-XAS, micro-ARPES, XMCD and XMLD measurements.More info) instrument which has been developed and commissioned in the recent years for spectro-microscopy applications utilizing the depth sensitivity in the keV energy range.