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Laboratory & Lab instruments

X-ray photoelectron spectroscopy (XPS) for detailed chemical analysis of surfaces

RISE
Stockholm

Description

RISE unique combination of surface sensitive methods enables us to provide in-depth measurements and analyses, based on a variety of approaches, for faster and more reliable results.
X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a highly surface sensitive and powerful tool for surface chemical analysis, with the analysis depth 2-10 nanometer. XPS provides quantitative data of both the elemental composition and different chemical states of an element (i.e. different oxidation states, functional groups, etc.).
The surface sensitivity of XPS method is useful in many different applications, e.g. adhesion issues in laminates, after surface modification/treatment, corrosion issues, after cleaning of surfaces, determine amount and thickness of an adsorbed layer, detection of surfactant migration in water-based systems, etc.

Tags
Bio-based materials and polymers, Chemistry and Catalysis, Construction Materials, Industrial production and Manufacturing, Metallurgy and Mining, Nanotechnology and Nanomaterials, Pharma and Biotechnology

Offer / Action

Get access to RISE laboratory based XPS to characterize the surface chemistry of your material. Contact us for industry-related research and collaboration.

For example, if you plan for synchrotron XPS measurements it can be a good idea to first screen your samples with a lab based XPS, and gain information that can be used in application for funding

Contact

Marie Ernstsson
Senior Project Manager
+46 10 516 60 43
marie.ernstsson@ri.se